Questionnaire
Data Base for Plasma and Vacuum Technology

Supported by: VDI Technology Center, Germany
Vacuum and Plasma Technology Center, (KAPRA) Korea

Thin Films, Surfaces, Semiconductors, Plasmas, Vacuum, Flat Panel Displays, Microelectronics
· Technologies and Applications ·

Survey-Status and Perspectives
A. General   Institution, capacities, persons to contact
B. Technical part
thin films,
surfaces,
semiconductors 		B.1 Theory Simulation and modelling
B.2 Preparation Starting and auxiliary materials
Preparation of thin films, surfaces and semiconductors
Surface treatment techniques
B.3 Analysis and characterization  
B.4 Sources Deposition, etch
B.5 Materials  
C. Technical part
plasmas		 C.1 Generation Methods, gases
C.2 Application  
C.3 Diagnostics Methods
D. Technical part
Flat Panel Displays
(FPD)
Microelectronics		 D.1 General classification Displays
Microelectronics
E. Technical part vacuum E.1 Component Pumps
Gauges, mass flow control
E.2 Sealing Materials, valves and feedthroughs
E.3 Maintenance Leak detection, vacuum processing
F. Portrait of institution F.1 Self-Portrait Fields of activity, research projects etc.
F.2 Innovative products  
Contact address:
 		Dr. R. Fellenberg
VDI-Technology Center Physical Technologies
PO box 10 11 39, D-40002 Düsseldorf
Phone: +49 211 62 14-5 59, Fax: +49 211 62 14-4 84, E-Mail: fellenberg@vdi.de

Prof. J. G. Han
SungKyunKwan University
300 Chunchun-Dong Jangan-Gu, Suwon 440-746, Korea
Phone: +82 331 2 90-73 54, Fax: +82 3 31 2 90-73 86, E-Mail: jghan@yurim.skku.ac.kr
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